Laser Chamber Flow Control
This sketch shows a laser chamber flow control application that required a 3-gas mixture that could be adjusted on the fly. Three F-Series closed-loop flow controllers were used – one for each gas controlled. The mixture could be changed by adjusting the command signal to the corresponding flow controller. Since this is a closed-loop control scheme, the signal from the flow monitors could be used for data acquisition. This signal is available on pin 5 of the FQPV2’s main electrical connector.
A QB3 is also being used in this application to control vacuum in the charging chamber. The vacuum level is a critical component that requires repeatable control to help maintain the proper level of each gas in the laser chamber.
Products used in this application:
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QB3 High Flow (30 SCFM) Electronic Pressure Controller
$708.00 Select options This product has multiple variants. The options may be chosen on the product page -
FQPV2 Mass Flow Controller
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